Aiming at the problem of the abnormal information collected from manufacturing process is difficult to use and analysis based on “data rich,information poor” environment of manufacturing workshop in the digital factory,a novelty process quality monitoring technique was proposed based on SPC and Logistic regression.T2 control chart was established by the related data from key stage in MES system.The Logistic regression model was applied to dig abnormal data,and the manufacturing process dynamic monitoring model was optimized by T2 and Logistic model jointly.Taking a plasma-enhanced chemical vapour deposition process of TFT-LCD manufacturing company as example,the feasibility and effectiveness of the process quality monitoring method were verified.The result shows that considering the abnormal information by using Logistic model based on T2 control chart can improve the sensitivity and robust of process quality monitoring.