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基于分子动力学单晶硅的纳米压痕过程研究
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The research of nanoindentation process of monocrystalline silicon based on molecular dynamics
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    摘要:

    基于分子动力学的基本理论,在微纳米尺度下建立了单晶硅的纳米压痕分子动力学模型。研究了在纳米压痕过程中单晶硅基体的变形机理、势能变化和温度变化。研究发现:在纳米压痕过程中基体上出现了位错、空位及滑移带,基体两侧有凸起现象。当压头撤离时,基体与压头间存在颈缩现象。在系统达到平衡时系统的势能出现不同,这是因为原子位错运动使得系统增加的势能小于压头原子所做的功。温度的变化与位错变形的程度相关,位错变形越剧烈系统温度升高的越快。

    Abstract:

    Molecular dynamics model of monocrystalline silicon nanoindentation in the micro-nano-scale is established based on molecular dynamics theory. The deformation mechanism, potential energy change and temperature change of monocrystalline silicon is studied in the simulation process. Study found: The dislocation, vacancies and slip bands are observed on the substrate, there is projection phenomenon on both sides of substrate. When the indenter is evacuated, there is a phenomenon of necking between the substrate and the indenter. At the same time, the study found that the potential energy of the system is different when the system is in equilibrium, because the dislocation movement makes the system increased potential energy less than the work done by the indenter. The change of temperature is associated with the degree of dislocation deformation and the system temperature rises faster with intensity of dislocation deformation.

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朱瑛,樊虎,向智.基于分子动力学单晶硅的纳米压痕过程研究[J].机床与液压,2018,46(6):28-33.
. The research of nanoindentation process of monocrystalline silicon based on molecular dynamics[J]. Machine Tool & Hydraulics,2018,46(6):28-33

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  • 在线发布日期: 2018-05-11
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