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SiC高温激活退火炉反应室的温场均匀性研究
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Study on Temperature Field Uniformity of SiC High-Temperature Activated Annealing Furnace Reaction Chamber
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    摘要:

    SiC高温激活退火炉反应室的温度高、结构复杂,通工艺气体时易导致反应室内温度不均匀,影响产品质量。为获得高均匀温场的反应室,根据退火炉的设备数据建立反应室的物理模型;基于固体和流体传热、表面对表面辐射传热模型等,应用COMSOL Multiphysics6.0系统构建退火炉反应室仿真模型。通过改变工艺管、衬管结构,优化加热器距离、气体流量、隔热屏高度等参数来模拟退火炉反应室的温度分布情况。仿真结果表明:将工艺管和衬管设计为嵌套结构,加热器距离为9 mm、流量为25 L/min、隔热屏高度为178 mm时,最大温差由340 ℃降至±4 ℃,反应室内温场均匀性达到最优。

    Abstract:

    The reaction chamber of SiC high-temperature activated annealing furnace has high temperature and complex structure,it is easy to cause uneven temperature in the reaction chamber with passing the process gas,which affects product quality.In order to obtain a highly uniform temperature field reaction chamber,a physical model of the reaction chamber was established based on the equipment data of the annealing furnace.Based on solid and fluid heat transfer,surface-to-surface radiation heat transfer models,etc,COMSOL Multiphysics 6.0 system was used to build a simulation model of annealing furnace reaction chamber.The temperature distribution of the annealing furnace reaction chamber was simulated by changing the structure of the process pipe and liner pipe,optimizing the heater distance,gas flow,heat insulation screen height and other parameters.The results show that when the process pipe and liner pipe are made into a nested structure,the heater distance is 9 mm,the flow is set to 25 L/min,and the height of the heat insulation screen is 178 mm,the maximum temperature difference is reduced from 340 ℃ to ±4 ℃,and the uniformity of the temperature field in the reaction chamber is optimized.

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周铁,吴永明,张毅. SiC高温激活退火炉反应室的温场均匀性研究[J].机床与液压,2024,52(2):181-186.
ZHOU Tie, WU Yongming, ZHANG Yi. Study on Temperature Field Uniformity of SiC High-Temperature Activated Annealing Furnace Reaction Chamber[J]. Machine Tool & Hydraulics,2024,52(2):181-186

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  • 在线发布日期: 2024-01-31
  • 出版日期: 2024-01-28